Thin Solid Films
ISSN:0040-6090

Thin Solid Films

THIN SOLID FILMS
学科领域:材料科学
是否预警:不在预警名单内
是否OA:
录用周期:约7.5个月
新锐分区:材料科学4区
年发文量:266
影响因子:2
JCR分区:Q3

基本信息

《固体薄膜》是一本国际期刊,为从事薄膜合成、表征和应用领域的科学家和工程师提供服务。薄膜领域可以被定义为材料科学、表面科学和应用物理学的汇合点,已经成为科学奋进的一个可识别的统一学科。
0040-6090SCIE/Scopus收录
2
2.2
2026年3月发布
点击查看历史分区趋势    >
大类学科小类学科Top期刊综述期刊
材料科学4区
MATERIALS SCIENCE, MULTIDISCIPLINARY 材料科学:综合
4区
MATERIALS SCIENCE, COATINGS & FILMS 材料科学:膜
3区
PHYSICS, APPLIED 物理:应用
4区
PHYSICS, CONDENSED MATTER 物理:凝聚态物理
3区
N/A
WOS期刊SCI分区  2024-2025最新升级版
按JIF指标学科分区收集子录JIF分区JIF排名百分位
学科:MATERIALS SCIENCE, COATINGS & FILMS
SCIE
Q3
16/24
学科:MATERIALS SCIENCE, MULTIDISCIPLINARY
SCIE
Q3
325/461
学科:PHYSICS, APPLIED
SCIE
Q3
130/187
学科:PHYSICS, CONDENSED MATTER
SCIE
Q3
51/80
按JCR指标学科分区收集子录JCR分区JCR排名百分位
学科:MATERIALS SCIENCE, COATINGS & FILMS
SCIE
Q3
14/24
学科:MATERIALS SCIENCE, MULTIDISCIPLINARY
SCIE
Q3
310/463
学科:PHYSICS, APPLIED
SCIE
Q3
128/187
学科:PHYSICS, CONDENSED MATTER
SCIE
Q3
46/80
175
266
13%87约7.5个月-工程技术-材料科学:膜
5%
时间预警情况
2026年03月发布的新锐学术版不在预警名单中
2025年03月发布的2025版不在预警名单中
2024年02月发布的2024版不在预警名单中
2023年01月发布的2023版不在预警名单中
2021年12月发布的2021版不在预警名单中
2020年12月发布的2020版不在预警名单中
100.00%9.31%0.36%
CiteScore:3.90
SJR:0.419
SNIP:0.690
学科类别分区排名百分位
大类:Materials Science
小类:Metals and Alloys
Q2
51 / 175
大类:Materials Science
小类:Surfaces, Coatings and Films
Q2
61 / 132
大类:Materials Science
小类:Surfaces and Interfaces
Q2
28 / 60
大类:Materials Science
小类:Electronic, Optical and Magnetic Materials
Q2
149 / 305
大类:Materials Science
小类:Materials Chemistry
Q2
162 / 324

期刊高被引文献

Electroless copper deposition: A critical review
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2018.11.016
Flexible hard TiAlSiN nanocomposite coatings deposited by modulated pulsed power magnetron sputtering with controllable peak power
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2018.10.031
Tuning high power impulse magnetron sputtering discharge and substrate bias conditions to reduce the intrinsic stress of TiN thin films
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.05.054
Control of composition and grain growth in Cu2ZnSnS4 thin films from nanoparticle inks
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.02.004
Study of phase formulation in CrN thin films and its response to a minuscule oxygen flow in reactive sputtering process
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2018.10.009
Development of reflective back contacts for high-efficiency ultrathin Cu(In,Ga)Se2 solar cells
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2018.12.041
First-principles prediction of the quaternary half-metallic ferromagnets TiZrIrZ (Z = Al, Ga or In) for spintronics applications
来源期刊:Thin Solid FilmsDOI:10.1016/j.tsf.2019.137564
Silicon nanofilms as anode materials for flexible lithium ion batteries
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.137516
Synthesis and room temperature NO2 gas sensitivity of vanadium dioxide nanowire structures by chemical vapor deposition
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2018.11.046
Coating thickness effect of metallic glass thin film on the fatigue-properties improvement of 7075 aluminum alloy
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.03.021
Carrier transport properties in a thin-film Cu2ZnSnSe4 solar cell
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.01.052
The effect of the deposition rate on microstructural and opto-electronic properties of β-Sn layers
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2018.12.009
Optimization of CdxZn1-xS compound from CdS/ZnS bi-layers deposited by chemical bath deposition for thin film solar cells application
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.03.003
Thin films composed of metal nanoparticles (Au, Ag, Cu) dispersed in AlN: The influence of composition and thermal annealing on the structure and plasmonic response
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.02.047
Characterization of polycrystalline In(y)Al(x)Sb(1-x-y) films deposited by magnetron sputtering
来源期刊:Thin Solid FilmsDOI:10.1016/j.tsf.2019.137630
The crystallization character of W-Cu thin films at the early stage of deposition
来源期刊:Thin Solid FilmsDOI:10.1016/j.tsf.2019.137555
Structural evolution and electrochemical corrosion behavior of Al–Ti–O amorphous-nanocrystalline composite films deposited by magnetron sputtering
来源期刊:Thin Solid FilmsDOI:10.1016/j.tsf.2019.137640
Characterization and investigation of in vitro properties of antibacterial copper deposited on bioactive ZrO2 coatings on zirconium
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.04.042
Effect of seed layers and rapid thermal annealing on the temperature coefficient of resistance of NiCr thin films
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.02.001
Effects of lattice parameter manipulations on electronic and optical properties of BaSi2
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.137436
Understanding the deformation and cracking behavior of Cr-based coatings deposited by hybrid direct current and high power pulse magnetron sputtering: From nitrides to oxynitrides
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.06.004
Thermal stability of Al2O3/TiO2 stacks for boron emitter passivation on n-type silicon solar cells
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2018.10.030
Alkali treatment for single-stage co-evaporated thin CuIn0.7Ga0.3Se2 solar cells
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2018.12.022
Cold atmospheric pressure plasma-polymerized organosilicon oxide films for enhancing scratch resistance of flexible carbon fiber-reinforced polymer composites
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.137420
Effect of water and methanol solvents on the properties of CuO thin films deposited by spray pyrolysis
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.05.001
Diamond like carbon films with embedded Cu nanoclusters deposited by reactive high power impulse magnetron sputtering: Pulse length effects
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.01.011
Electrochemical nucleation and optical characterization of highly oriented Bi clusters on Cu substrate
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.05.042
Spectroscopic ellipsometry data analysis using penalized splines representation for the dielectric function
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2018.10.057
Current Status of Catalytic Chemical Vapor Deposition Technology ━ History of Research and Current Status of Industrial Implementation ━
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.03.024
High-rate reactive high-power impulse magnetron sputtering of transparent conductive Al-doped ZnO thin films prepared at ambient temperature
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.04.009
Effect of hydrogen on mechanical stability of amorphous In–Sn–O thin films for flexible electronics
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2018.10.043
Tolerance to electron beams of TiO2 film photocatalyst
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.137421
High temperature coefficient of resistance and low noise tungsten oxide doped amorphous vanadium oxide thin films for microbolometer applications
来源期刊:Thin Solid FilmsDOI:10.1016/j.tsf.2019.137590
On the microstructure of magnesium thin films deposited by magnetron sputtering
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.137501
Formation and characterization of Ni, Pt, and Ti stanogermanide contacts on Ge0.92Sn0.08
来源期刊:Thin Solid FilmsDOI:10.1016/j.tsf.2019.137568
Growth of ZnO:Al by atomic layer deposition: Deconvoluting the contribution of hydrogen interstitials and crystallographic texture on the conductivity
来源期刊:Thin Solid FilmsDOI:10.1016/j.tsf.2019.137533
The effects of applied current density and bath concentration on the morphology, crystal structure and optical properties of electrodeposited hematite thin films
来源期刊:Thin Solid FilmsDOI:10.1016/j.tsf.2019.137633
Effects of bath temperature and deposition time on Co3O4 thin films produced by chemical bath deposition
来源期刊:Thin Solid FilmsDOI:10.1016/j.tsf.2019.137632
Effects of injected ion energy on silicon carbide film formation by low-energy SiCH3+ beam irradiation
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.06.057
Mitigating early fracture of amorphous metallic thin films on flexible substrates by tuning substrate roughness and buffer layer properties
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.137493
High performance piezoresistive response of nanostructured ZnO/Ag thin films for pressure sensing applications
来源期刊:Thin Solid FilmsDOI:10.1016/j.tsf.2019.137587
Plasma-induced recovery of plasmonic sensitivity of aged silver nanoparticles to ethanol vapor and plasma exposure-time dependence
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.01.018
Thermal stability of a-C:H:SiOx thin films in hydrogen atmosphere
来源期刊:Thin Solid FilmsDOI:10.1016/j.tsf.2019.137531
The effect of chemical additives in phosphoric acid anodization of aluminum-tantalum thin films
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.06.033
Photoluminescence quenching of green synthesized manganese doped zinc oxide by sodium iodide doped Polypyrrole polymer
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.137510
Influence of film thickness on the dielectric characteristics of hafnium oxide layers
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.137517
The interaction of an amphiphile crown ether with divalent metal ions. An electrochemical, Langmuir film, and molecular modeling study
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.05.019
Analytical comparison of atomic layer deposition of oxide films inside trench and hole nanostructures
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2018.12.038
Effect of boron/phosphorus ratio in lithium boron phosphorus oxynitride thin film electrolytes for all-solid-state thin film batteries
来源期刊:Thin Solid FilmsDOI:10.1016/J.TSF.2019.06.055
Lateral inhomogeneities in W/C multilayer mirrors
来源期刊:Thin Solid FilmsDOI:10.1016/j.tsf.2019.137611

相关文章

2026年3月发布
大类学科小类学科Top期刊综述期刊
材料科学4区
MATERIALS SCIENCE, MULTIDISCIPLINARY 材料科学:综合
4区
MATERIALS SCIENCE, COATINGS & FILMS 材料科学:膜
3区
PHYSICS, APPLIED 物理:应用
4区
PHYSICS, CONDENSED MATTER 物理:凝聚态物理
3区
N/A
2025年3月升级版
大类学科小类学科Top期刊综述期刊
材料科学4区
MATERIALS SCIENCE, COATINGS & FILMS 材料科学:膜
3区
PHYSICS, CONDENSED MATTER 物理:凝聚态物理
3区
MATERIALS SCIENCE, MULTIDISCIPLINARY 材料科学:综合
4区
PHYSICS, APPLIED 物理:应用
4区
2023年12月旧的升级版
大类学科小类学科Top期刊综述期刊
材料科学4区
MATERIALS SCIENCE, COATINGS & FILMS 材料科学:膜
4区
MATERIALS SCIENCE, MULTIDISCIPLINARY 材料科学:综合
4区
PHYSICS, APPLIED 物理:应用
4区
PHYSICS, CONDENSED MATTER 物理:凝聚态物理
4区