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PLASMA CHEMISTRY AND PLASMA PROCESSING
ISSN：0272-4324

PLASMA CHEMISTRY AND PLASMA PROCESSING

PLASMA CHEM PLASMA P
学科领域：物理与天体物理
是否预警：不在预警名单内
是否OA：否
录用周期：较慢,6-12周
新锐分区：物理与天体物理3区
年发文量：95
影响因子：2.5
JCR分区：Q2

基本信息

出版关于等离子体化学和等离子体处理的基础和应用研究的原创论文，该杂志的范围包括从非热等离子体到热等离子体的等离子体处理，以及基础等离子体研究和特定等离子体应用的研究。这些应用包括但不限于等离子体催化、包括液体和气体处理的环境处理、包括等离子体医学和农业的等离子体生物应用、表面改性和沉积、粉末和纳米结构合成、包括等离子体燃烧和重整的能量应用、资源回收、等离子体和电化学的耦合以及等离子体蚀刻。等离子体中的化学动力学研究，以及等离子体与表面的相互作用。重要的是，提交的材料应包括对等离子体作用的实质性考虑，例如，相关的等离子体化学、等离子体物理或等离子体-表面相互作用;仅考虑使用等离子体处理的材料或物质的性质的稿件不在该杂志的范围之内。
0272-4324SCIE/Scopus收录
2.5
点击查看最新影响趋势>
3.4
新
2026年3月发布
点击查看历史分区趋势    >
大类学科小类学科Top期刊综述期刊
物理与天体物理3区
ENGINEERING, CHEMICAL 工程：化工
3区
PHYSICS, APPLIED 物理：应用
3区
PHYSICS, FLUIDS & PLASMAS 物理：流体与等离子体
3区
否
N/A
新
WOS期刊SCI分区  2024-2025最新升级版
按JIF指标学科分区收集子录JIF分区JIF排名百分位
学科：ENGINEERING, CHEMICAL
SCIE
Q3
97/176
学科：PHYSICS, APPLIED
SCIE
Q3
101/187
学科：PHYSICS, FLUIDS & PLASMAS
SCIE
Q2
13/41
按JCR指标学科分区收集子录JCR分区JCR排名百分位
学科：ENGINEERING, CHEMICAL
SCIE
Q2
69/176
学科：PHYSICS, APPLIED
SCIE
Q2
77/187
学科：PHYSICS, FLUIDS & PLASMAS
SCIE
Q2
20/41
57
95
点击查看年发文量趋势图>
18%0较慢,6-12周-工程技术-工程：化工
12%
点击查看自引率趋势图>
时间预警情况
2026年03月发布的新锐学术版不在预警名单中
2025年03月发布的2025版不在预警名单中
2024年02月发布的2024版不在预警名单中
2023年01月发布的2023版不在预警名单中
2021年12月发布的2021版不在预警名单中
2020年12月发布的2020版不在预警名单中
93.68%18.48%2.02%
CiteScore：5.10
SJR：0.462
SNIP：0.854
学科类别分区排名百分位
大类：Physics and Astronomy
小类：Condensed Matter Physics
Q2
130 / 443
大类：Physics and Astronomy
小类：General Chemical Engineering
Q2
97 / 274
大类：Physics and Astronomy
小类：General Chemistry
Q2
143 / 404
大类：Physics and Astronomy
小类：Surfaces, Coatings and Films
Q2
49 / 132

期刊高被引文献

Plasma activated water: the next generation eco-friendly stimulant for enhancing plant seed germination, vigor and increased enzyme activity, a study on black gram (Vigna mungo L.)
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10028-3
Fluid Modelling of DC Argon Microplasmas: Effects of the Electron Transport Description
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09994-5
Numerical Study of Jet–Target Interaction: Influence of Dielectric Permittivity on the Electric Field Experienced by the Target
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10033-6
Plasma-Chemistry of Arsenic Selenide Films: Relationship Between Film Properties and Plasma Power
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10035-4
Monocrystalline Quartz ICP Etching: Road to High-Temperature Dry Etching
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10025-6
Microwave Plasma Jet in Water: Effect of Water Electrical Conductivity on Plasma Characteristics
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10034-5
Induction Plasma Synthesis of Graphene Nano-flakes with In Situ Investigation of Ar–H2–CH4 Plasma by Optical Emission Spectroscopy
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09997-2
Generation of Long Laminar Plasma Jets: Experimental and Numerical Analyses
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-018-9949-4
Plasma Jet and Dielectric Barrier Discharge Treatment of Wheat Seeds
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09991-8
The Application of the Microwave Plasma Ionization Source in Ambient Mass Spectrometry
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09988-3
A Microfluidic Atmospheric-Pressure Plasma Reactor for Water Treatment
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09970-z
Plasma-Catalytic Dry Reforming of CH4 over Calcium Oxide: Catalyst Structural and Textural Modifications
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09966-9
Hydrogen Production from Methane Decomposition Using a Mobile and Elongating Arc Plasma Reactor
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-018-9950-y
Activation of the Normal Human Skin Cells by a Portable Dielectric Barrier Discharge-Based Reaction-Discharge System of a Defined Gas Temperature
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10039-0
Influence of Nanoseconds Pulsed Discharges on the Composition of Intermediate and Final Combustion Products in the HCCI Engine
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09964-x
Nitrogen-Doped Titanium Dioxide Thin Films Formation on the Surface of PLLA Electrospun Microfibers Scaffold by Reactive Magnetron Sputtering Method
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09956-x
Efficiency of Ozone Production in Coplanar Dielectric Barrier Discharge
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09993-6
Plasma Enhanced Chemical Vapor Deposition of Poly(Cyclohexyl Methacrylate) as a Sacrificial Thin Film
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10038-1
Regeneration of a Coked Zeolite via Nonthermal Plasma Process: A Parametric Study
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09972-x
Role of electron–ion dissociative recombination in CH 4 microwave plasma on basis of simulations and measurements of electron energy
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/S11090-019-10005-W
Chemical Non-equilibrium Simulation of Anode Attachment of an Argon Transferred Arc
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10027-4
Simulation for the Characteristics of Plasma of the Multi-gap Pseudospark Discharge
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09983-8
Study on Generation of Glow Discharge Plasma in Air and Surface Modification of Wool Fabric
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09952-1
NO Oxidation with NaClO, NaClO2, and NaClO3 Solution Using Electron Beam and a One Stage Absorption System
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10022-9
Characterization of Gaseous Plasma Sustained in Mixtures of HMDSO and O2 in an Industrial-Scale Reactor
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10026-5
Synergistic Effect of Plasma Discharge and Substrate Temperature in Improving the Crystallization of $$\\hbox {TiO}_2$$TiO2 Film by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/S11090-019-09961-0
Study on the Physical and Chemical Characteristics of DBD: The Effect of N2/O2 Mixture Ratio on the Product Regulation
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09998-1
Densities of Active Species in R/x%(N2–5%H2) (R\u2009=\u2009Ar or He) Microwave Flowing Afterglows
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09992-7
Pulse Plasma Deposition of Terpinen-4-ol: An Insight into Polymerization Mechanism and Enhanced Antibacterial Response of Developed Thin Films
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10045-2
Underwater Electrical Discharges: Temperature, Density and Basic Instability Features with Different Anode Materials
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09968-7
About the Development and Dynamics of Microdischarges in Toluene-Containing Air
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09971-y
Lignite Gasification in Thermal Steam Plasma
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09957-w
Abatement of Tetrafluormethane Using Thermal Steam Plasma
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10047-0
The Role of High Voltage Electrode Material in the Inactivation of E. coli by Direct-in-Liquid Electrical Discharge Plasma
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09980-x
The Decomposition Pathways of SF6 in the Presence of Organic Insulator Vapors
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10055-0
Atmospheric Pressure Nonthermal Plasma Synthesis of Magnesium Nitride as a Safe Ammonia Carrier
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10002-z
Combustion of Inert-Gas-Diluted Volatile Organic Compounds Using a Fuel-Rich Pilot Flame and Rotating Arc Plasma
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09953-0
Kinetic Modelling of Atmospheric Pressure Corona Discharges in Humid Air
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10006-9
Optical Radiation Associated with Photobiological Hazards for Argon GTAW Arcs
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09967-8
Rooting and Related Physiological Characteristics Responses to Stolon Cuttings Pre-treatment by Cold Plasma in Centipedegrass (Eremochloa ophiuroides (Munro.) Hack.)
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10003-y
Equilibrium Chemistry in BCl3\\documentclass[12pt]{minimal} \\usepackage{amsmath} \\usepackage{wasysym} \\usepackage{amsfonts} \\usepackage{amssymb} \\usepackage{amsbsy} \\usepackage{mathrsfs} \\usepackage{upgreek} \\setlength{\\oddsidemargin}{-69pt} \\begin{document}$${\\text {BCl}}_3$$\\end{document}–H2\\docume
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09985-6
Temporal Evolution of Polarization Resolved Laser-Induced Breakdown Spectroscopy of Cu
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10042-5
A Study on the NF3 Plasma Etching Reaction with Cobalt Oxide Grown on Inconel Base Metal Surface
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09979-4
Plasma Polymer Layers with Primary Amino Groups for Immobilization of Nano- and Microparticles
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10056-z
Formation of CuCo Alloy From Their Oxide Mixtures Through Reduction by Low-Temperature Hydrogen Plasma
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09963-y
Ab Initio Chemical Kinetics for the Thermal Decomposition of SiH2+ and SiH3+ Ions and Related Reverse Ion–Molecule Reactions of Interest to PECVD of α-Si:H Films
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10012-x
Silicon Oxide Barrier Films Deposited on Polycarbonate Substrates in Pulsed Plasmas
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10049-y
Plasmon Thin Film Transistor Using Plasma Polymerized Aniline–Rubrene–Gold Nanocomposite in One-Step Process
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10030-9
Strong Sensitized Ultraviolet Luminescence from He–C2F4–NO Flowing Plasma Afterglow: A Route to Short-Wavelength Gas-Flow Lasers?
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-09978-5
Correction to: Rooting and Related Physiological Characteristics Responses to Stolon Cuttings Pre-treatment by Cold Plasma in Centipedegrass (Eremochloa ophiuroides (Munro.) Hack.)
来源期刊：Plasma Chemistry and Plasma ProcessingDOI：10.1007/s11090-019-10009-6

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学科领域：物理与天体物理
影响因子：1.8
中科院分区： 3区
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学科领域：物理与天体物理
影响因子：0.8
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Advances in Theoretical and Mathematical Physics封面

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影响因子：1
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ANNALES HENRI POINCARE封面

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学科领域：物理与天体物理
影响因子：1.3
中科院分区： 3区
论文发表 2-4个月录用 7500+文章录用 不成功可退款
新
2026年3月发布
大类学科小类学科Top期刊综述期刊
物理与天体物理3区
ENGINEERING, CHEMICAL 工程：化工
3区
PHYSICS, APPLIED 物理：应用
3区
PHYSICS, FLUIDS & PLASMAS 物理：流体与等离子体
3区
否
N/A
2025年3月升级版
大类学科小类学科Top期刊综述期刊
物理与天体物理3区
ENGINEERING, CHEMICAL 工程：化工
3区
PHYSICS, APPLIED 物理：应用
3区
PHYSICS, FLUIDS & PLASMAS 物理：流体与等离子体
3区
否
否
2023年12月旧的升级版
大类学科小类学科Top期刊综述期刊
物理与天体物理3区
ENGINEERING, CHEMICAL 工程：化工
3区
PHYSICS, APPLIED 物理：应用
3区
PHYSICS, FLUIDS & PLASMAS 物理：流体与等离子体
3区
否
否