ECS Journal of Solid State Science and Technology

Thermal Simulations of High Current β-Ga2O3 Schottky Rectifiers

Switching behavior and forward bias degradation of 700V, 0.2a, β-Ga2O3 vertical geometry rectifiers

60Co gamma ray damage in homoepitaxial β-Ga2O3 Schottky rectifiers

Electronic Properties of Ga2O3 Polymorphs

Damage Recovery and Dopant Diffusion in Si and Sn Ion Implanted β-Ga2O3

Influence of Post-Annealing on Properties of α-Ga2O3 Epilayer Grown by Halide Vapor Phase Epitaxy

A Breakthrough Method for the Effective Conditioning of PVA Brush Used for Post-CMP Process

Comparison of Dual-Stack Dielectric Field Plates on β-Ga2O3 Schottky Rectifiers

First Principles Study of the Ambipolarity in a Germanene Nanoribbon Tunneling Field Effect Transistor

Valence and Conduction Band Offsets for InN and III-Nitride Ternary Alloys on (−201) Bulk β-Ga2O3

Low-frequency noise assessment of work function engineering cap layers in high-k gate stacks

Correlating Coefficient of Friction and Shear Force to Platen Motor Current in Tungsten and Interlayer Dielectric Chemical Mechanical Planarization at Highly Non-Steady-State Conditions

Influence of Oxygen Pressure on Growth of Si-Doped β-(AlxGa1 − x)2O3 Thin Films on c-Sapphire Substrates by Pulsed Laser Deposition

Communication—formation of a superconducting MgB2-containing coating on niobium by plasma electrolytic oxidation

Insights into tungsten chemical mechanical planarization: Part II. Effect of pad surface micro-texture on frictional, thermal and kinetic aspects of the process

A Water Polishing Process to Improve Ceria Abrasive Removal

Implementation of a 900 V Switching Circuit for High Breakdown Voltage beta-Ga2O3 Schottky Diodes

Optimization of Edge Termination Techniques for β-Ga2O3 Schottky Rectifiers

Role of Ammonium Ions in Colloidal Silica Slurries for Ru CMP

Red Light-Emitting Electrochemical Cells Employing Pyridazine-Bridged Cationic Diiridium Complexes

Solution-Processed Semitransparent Inverted Organic Solar Cells from a Transparent Conductive Polymer Electrode

The effect of oxygen partial pressure and annealing process on the characteristics of ZnGa2O4 MSM UV photodetector

Defect Characterization of Multicycle Rapid Thermal Annealing Processed p-GaN for Vertical Power Devices

Ultra-Rapid Determination of Material Removal Rates Based Solely on Tribological Data in Chemical Mechanical Planarization

Effect of Annealing on the Band Alignment of ALD SiO2 on (AlxGa1-x)2O3 for x = 0.2 - 0.65

Annealing Induced Interfacial Evolution of Titanium/Gold Metallization on Unintentionally Doped Beta-Ga2O3

On the Impact of Strained PECVD Oxide Layers on Oxide Precipitation in Silicon

Frequency-Dependent Impedance Responses of ZnO Using UV Light

Selective scattering of blue and red light based on silver and gold nanocubes

Characteristics of Slurry Recycling in Chemical Mechanical Polishing (CMP) of Fused Silica (FS)

Etch Damages of Ovonic Threshold Switch (OTS) Material by Halogen Gas Based-Inductively Coupled Plasmas

Investigation of a Standard Particle Deposition System on Wafer Surface and Its Application to Wafer Cleaning

Modulation of Electrical Conductivity and Lattice Distortions in Bulk HVPE-Grown GaN

Effect of Controlling Abrasive Size in Slurry for Tungsten Contact CMP Process

Evaluation of Size Distribution Measurement Methods for Sub-100 nm Colloidal Silica Nanoparticles and Its Application to CMP Slurry

On the Impact of Strained PECVD Nitride Layers on Oxide Precipitate Nucleation in Silicon

Effects of hydrogen plasma treatment condition on electrical properties of β-Ga2O3

Optimizing GaxOy Growth Tendency of 3D Structures on Different Substrates through the MOCVD Technique

Porous Silicon Based Rugate Filter Wheel for Multispectral Imaging Applications

Post-CMP Cleaning of InGaAs Surface for the Removal of Nanoparticle Contaminants for Sub-10nm Device Applications

Micro-Opto-Electro-Mechanical Device Based on Flexible β-Ga2O3 Micro-Lamellas

Review—Beyond the highs and lows: A perspective on the future of dielectrics research for nanoelectronic devices

A Wafer-Scale Material Removal Rate Model for Chemical Mechanical Planarization

Fabrication of Micro-Sized Copper Columns Using Localized Electrochemical Deposition with a 20 μm Diameter Micro Anode

Annealing of proton and alpha particle damage in Au-W/β-Ga2O3 rectifiers

Effect of low temperature RF plasma treatment on electrical properties of junctionless InGaAs MOSFETs

Communication—Screen-Printed Silver Electrodes for Enhanced Performance in Light-Emitting Devices Based on Electrochemiluminescence